雜志介紹

Journal Of Vacuum Science & Technology A雜志介紹

《Journal Of Vacuum Science & Technology A》是一本以English為主的未開放獲取國際優秀期刊，中文名稱真空科學與技術學報，本刊主要出版、報道材料科學-MATERIALS SCIENCE, COATINGS & FILMS領域的研究動態以及在該領域取得的各方面的經驗和科研成果，介紹該領域有關本專業的最新進展，探討行業發展的思路和方法，以促進學術信息交流，提高行業發展。該刊已被國際權威數據庫SCIE收錄，為該領域相關學科的發展起到了良好的推動作用，也得到了本專業人員的廣泛認可。該刊最新影響因子為2.4，最新CiteScore 指數為5.1。

本刊近期中國學者發表的論文主要有：

• Selectivity dependence of atomic layer deposited manganese oxide on the precursor ligands on platinum facets

  Author: Lan, Yuxiao; Wen, Yanwei; Li, Yicheng; Yang, Jiaqiang; Cao, Kun; Shan, Bin; Chen, Rong

• Dynamic character of compositional sputter depth profiling by SIMS: A comparison of different models for quantitative profile evaluation

  Author: Hofmann, Siegfried; Zhong, Feng-Min; Yang, Hao; Wang, Jiang-Yong; Xu, Cong-Kang

• Aluminum nitride crystal-based photodetector with bias polarity-dependent spectral selectivity

  Author: Fan, Zelong; Qin, Zuoyan; Jin, Lei; Cao, Yuan; Yue, Zhongyu; Li, Baikui; Wu, Honglei; Sun, Zhenhua

• Effect of plasma nitriding substrate current density on the adhesion strength of in situ PVD TiN coatings

  Author: Zhang, Xin; Tian, Xiu-bo; Gong, Chun-zhi; Liu, Xiang-li; Li, Jin

英文介紹

Journal Of Vacuum Science & Technology A雜志英文介紹

Journal of Vacuum Science & Technology A publishes reports of original research, letters, and review articles that focus on fundamental scientific understanding of interfaces, surfaces, plasmas and thin films and on using this understanding to advance the state-of-the-art in various technological applications.